Ultra-flat thermal SiO2 wafers, 200nm, type <100> stock ranging from atmosphere to 0

ranging from atmosphere to 0

red and green Wire gauge (AWG) / Number of strands 24 / 7 Wire insulation PTFE Wire length 8" Operating temperature -20°C to 125°C Applications High voltage or instrumentation CF feedthroughs available upon enquiry

5mm and 1mm

some particles can be missing or could have been on a different location

Ultra-flat thermal SiO2 wafers, 200nm, type <100> stock ranging from atmosphere to 0The Ultra Flat SiO2 substrates consist of a 200nm thermally grown amorphous SiO2 film on an ultra flat silicon wafer. SiO2 is one of the most characterised materials and is widely used in semiconductor manufacturing, thin film research and as substrate for growing cells. It can be directly used as substrate for AFM and SEM imaging. The ultra flat thermal silicon dioxide substrates are available in 6" wafer and conveniently diced 5 x 5mm, 5 x 7mm and